#7330. Corrigendum to ’Effect of 150 keV Ti? ion implantation on the structural, optical, and electrical properties of nonstoichiometric WO2.72 thin films’: [Materials Research Bulletin 145 (20XX) 111566] (Materials Research Bulletin (20XX) 145, (S0025540821003639), (10.1016/j.materresbull.20XX.111566))

October 2026publication date
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Mechanical Engineering;
Mechanics of Materials;
Condensed Matter Physics;
Materials Science (all);
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Abstract:
The negative ion implanter beam facility was used in this study. The experimental results or the interpretation are presented in this research paper.
Keywords:
Titanium ions, thin films, implantation, nonstoichiometric

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